產(chǎn)品
- RV系列雙級旋片泵
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- nES系列單級旋片泵
- ES系列單級旋片泵
- nXDS系列干式渦旋泵
- nXLi系列干式真空泵
- EDC系列爪式真空泵
- EOSi系列噴油螺桿泵
- EH系列羅茨真空泵
- EDS系列干式螺桿泵
- GXS系列干式螺桿泵
- GV系列爪式真空泵
- T-Station渦輪分子泵小車
- STP系列渦輪分子泵
- Stokes滑閥泵
- Stokes 6羅茨泵
- D-LAB系列隔膜真空泵
- nEXPT系列分子泵站
- nEXT系列渦輪分子泵
- EDP系列化工爪式干泵
- CXS系列化工螺桿真空泵
- CDX系列化工螺桿真空泵
- HT系列油蒸汽擴(kuò)散泵
- iH系列半導(dǎo)體真空干泵
- iXH系列半導(dǎo)體真空泵
- iXL系列半導(dǎo)體真空干泵
- EPX系列半導(dǎo)體真空干泵
- GX系列半導(dǎo)體干式泵
產(chǎn)品詳情
簡單介紹:
STP-iXA4506C 愛德華磁懸浮渦輪分子泵由于采用全集成控制器和電源,不需要電纜和單獨(dú)的
STP-iXA4506C 愛德華磁懸浮渦輪分子泵使用的,為如今具有挑戰(zhàn)性的應(yīng)用提供業(yè)內(nèi)的性能、更好的氣流能力和高溫管理。
詳情介紹:
概述
Edwards STP-iXA4506 系列磁懸浮渦輪分子泵 (TMP) 使用的,為如今具有挑戰(zhàn)性的應(yīng)用提供業(yè)內(nèi)的性能、更好的氣流能力和高溫管理。
特性與優(yōu)勢
由于采用全集成控制器和電源,不需要電纜和單獨(dú)的
控制器安裝卡槽,從而使 TMP 組件具有成本效益且結(jié)構(gòu)緊湊,能夠快速簡單地安裝在狹小的空間。
大連續(xù)流量達(dá) 4300 sccm (N2),與 STP-XA4503 相比性能提高 50% 以上。
使用高 35 °C 的冷卻水供應(yīng)時(shí),泵能夠高效運(yùn)轉(zhuǎn)。
提供了溫度管理系統(tǒng) (TMS) 裝置,用于處理在過程中產(chǎn)生的副產(chǎn)品。
I/O 遠(yuǎn)程、RS232C、RS485、STP-Link 是標(biāo)配端口。
UL 標(biāo)記,CE 標(biāo)記,符合 SEMI-S2 和 RoHS 標(biāo)準(zhǔn)
數(shù)據(jù)
法蘭
KF40
抽取速度
N2/H2
升/秒
VG300
3800/2700
ISO320F
4000/2700
VG350
4300/2700
VG400
4300/2700
壓縮比 N2/H2
>108 / 103
極限壓力
Pa (Torr)
10-7(10-9)
允許的前級壓力
Pa (Torr)
266(2)
大氣體流速 N2 1
4300
(僅水冷卻)
(Pa m3/sec)
(7.26)
大氣體流速 Ar 1
2600
(僅水冷卻)
(Pa m3/sec)
(4.39)
額定速度
rpm
24,240
啟動(dòng)時(shí)間
分鐘
11
固定位置
任何方向
輸入電壓
V
200-240
大輸入功率
不帶 TMS
VA
1700
帶 TMS
VA
2200
重量
kg
VG300
109
ISO320F
111
VG350
104
VG400
111
法蘭 |
|
KF40 |
抽取速度 |
|
|
N2/H2 | 升/秒 |
|
VG300 |
|
3800/2700 |
ISO320F |
|
4000/2700 |
VG350 |
|
4300/2700 |
VG400 |
|
4300/2700 |
壓縮比 N2/H2 |
|
>108 / 103 |
極限壓力 | Pa (Torr) | 10-7(10-9) |
允許的前級壓力 | Pa (Torr) | 266(2) |
大氣體流速 N2 1 |
|
4300 |
(僅水冷卻) | (Pa m3/sec) | (7.26) |
大氣體流速 Ar 1 |
|
2600 |
(僅水冷卻) | (Pa m3/sec) | (4.39) |
額定速度 | rpm | 24,240 |
啟動(dòng)時(shí)間 | 分鐘 | 11 |
固定位置 |
|
任何方向 |
輸入電壓 | V | 200-240 |
大輸入功率 |
|
|
不帶 TMS | VA | 1700 |
帶 TMS | VA | 2200 |
重量 | kg |
|
VG300 |
|
109 |
ISO320F |
|
111 |
VG350 |
|
104 |
VG400 |
|
111 |
Edwards STP iXA4506C 5-axis Magnetic Bearing Turbo-Molecular Pump, Corrosion Resistant Parts.
ISO320F Inlet, Integrated Controller and built in power supply.
Edwards PN YT780Z010.
ISO320F Inlet, Integrated Controller and built in power supply.
Edwards PN YT780Z010.
The STP iXA4506C Maglev turbo-molecular pump utilizes a magnetic bearing and motor drive system and has an ultimate pressure of 10-9 Torr. This integrated controller series can be fully interfaced with advanced controllers to operate on a wide range of applications and processes. It eliminates the need for a conventional, rack-mounted controller and interconnecting cables. The fully integrated product offers easy installation and small footprint as an all-in-one solution for all application tools. The rotor is entirely suspended by magnetic bearings so all contact between the rotor and the remainder of the pump is eliminated. As well as giving very low vibration, the elimination of contact means no bearing wear and no requirement for consequent pump maintenance.
Achieving world-class pumping speed of 4300 l/s (N2) and throughput up to 4300 sccm (N2), on a 12-16 inch (300-400 mm) inlet flange, makes the STP-iXA4506C the ideal choice for a wide range of large volume high flow applicaitons. The STP iXA4506C can be connected directly to a terminal using a serial port and the STP-link Monitoring Software. The Software Displays, Rotational Speed, Motor Status, Temperature, Rotor balance status and Magnet bearing current.
CORROSION RESISTANT:
This pump has nickel coated rotors and stators and pump internals are suitable for corrosive gas applications. This ensures a high level of resistance to corrosion.
MAGNETIC BEARING TECHNOLOGY:
The rotor is suspended by multi-axis magnetic bearings, so all contact between the rotor and the remainder of the pump is eliminated. As well as giving very low vibration, the elimination of contact means no bearing wear and no requirement for maintenance.
VIBRATION FREE:
Magnetic levitation of the rotor results in an extremely low level of noise and vibration. Peakto- peak vibration level is less than 0.02 μm. This amplitude remains constant throughout the life of the pump and is free from troublesome subharmonics.
OIL FREE:
All STP turbomolecular pumps are oil free. The use of magnetic bearings eliminates all hydrocarbon lubricants ensuring no contamination of the vacuum process from the turbomolecular pump. This feature is vital in industry and in surface science or high energy physics applications (where even minute degrees of contamination disrupt measurements).
MAINTENANCE FREE:
Unlike conventional mechanical bearings, magnetic levitation means there is no frictional contact, eliminating sources of wear and vibration. This feature enables STP turbomolecular pumps to run for years with virtually no maintenance, reducing annual operating costs to a minimum and ensuring maximum up-time is achieved. This maintenance free feature can be particularly beneficial on processes producing chemical or radioactive contamination.
AUTOMATIC BALANCING SYSTEM (ABS):
ABS is a unique patented development of 5-axis technology. If any rotor imbalance is introduced (by deposition of process by-products, for example), sensors in the pump detect changes in the rotor motion and compensate the magnetic bearing fields to allow the rotor to spin on its natural inertial axis. This minimises the vibration transmitted to the inlet flange. ABS works at all pump rotational speeds.
SAFETY BACKUP BEARINGS:
STP pumps have dry lubricated axial and radial mechanical bearings as safety backup bearings. These support the rotor and protect the pump in the event of a total disruption of magnetic suspension or a massive air inrush which overcomes the magnetic bearing stiffness. These high precision ball bearings are dry lubricated and are not in contact with the rotor during normal operation..
The STP-iXA4506C can be used for a variety of applications including but not limited to:
- Plasma etch (chlorine, fluorine and bromine chemistries) for metal (aluminum), tungsten and dielectric (oxide) and polysilicon
- Electron cyclotron resonance (ECR) etch
- Film deposition CVD, PECVD, ECRCVD, MOCVD
- Sputtering
- Ion implantation source, beam line pumping end station
- MBE
- Diffusion
- Photo resist stripping
- Crystal/epitaxial growth
- Wafer inspection
- Load lock chambers
- Scientific instruments: surface analysis, mass spectrometry, electron microscopy
- High energy physics: beam lines, accelerators
- Radioactive applications: fusion systems, cyclotrons
